LithoWorld: An Endpoint World Model for Lithography Process-Window Recovery
Lithography process drift can move a fabricated pattern outside its process window, producing unqualified scanning electron microscopy (SEM) morphology. We present LithoWorld, an endpoint world model for SEM-guided parameter recovery. Interior representative targets jointly determine qualified reference appearance and correction supervision. A causal predictive branch aligns currentimage features with endpoint representations, while a conditional flow policy generates a two-dimensional correction as an action chunk. The model learns from 173 groups of measured SEMs organized as focus-exposure maps, preserving unmeasured cells as unknown. On 200 test pairs from the 73-group subset, LithoWo...
| Authors | Botong Zhao, Fang Yu, Xinyuan Chen et al. |
|---|---|
| Primary category | cs.CV |
| Published | 16 October 2026 |
| Last updated at source | 16 October 2026 |
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